Nicholas Sheehan

Nicholas Sheehan

Photochemistry of (η3-allyl)Ru(CO)3X Precursors for Photoassisted Chemical Vapor Deposition


Nicholas C. Sheehan, Christopher R. Brewer, Bryan Salazar, Olivia M. Hawkins, James D. Bullock, Valeria D. Kleiman, Amy V. Walker, and Lisa McElwee-White


Dr. Lisa McElwee-White


College of Liberal Arts and Sciences


<p class=”MsoNormal”>Photolysis of various (diene)Ru(CO)<sub>3</sub> precursors has indicated pathways for loss of both diene and CO ligands. Photolysis results, coupled with the volatility of these precursors, make them attractive for photoassisted chemical vapor deposition (PACVD). Quantum yields for loss of diene and CO ligands have been determined for the precursors as a method of screening for PACVD. Various diene complexes were studied to probe the influence of the diene on photolysis. Acyclic (1,3-butadiene and isoprene), antiaromatic (cyclobutadiene), and cyclic (1,3-cyclohexadiene) diene complexes were investigated. The mechanism and kinetics of precursor photolysis will be discussed in the context of function for photochemical deposition.</p>


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